The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Jun. 03, 2002
Applicant:
Eliyahu Averbukh, Rehovot, IL;
Inventor:
Eliyahu Averbukh, Rehovot, IL;
Assignee:
Yeda Research and Development Co. Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S001/00 ; H01S003/00 ;
U.S. Cl.
CPC ...
Abstract
A method and apparatus for performing atomic and molecular nano-deposition by means of atomic or molecular focusing through a plurality of optical standing waves. A stacked set of standing light waves, preferably arranged as gratings in a predetermined form and of predetermined intensities, is used to sequentially compress or squeeze the width of the incident atomic or molecular beam into ultra-narrow, spatially localized spots or lines. The result is a focused beam of particles with improved resolution compared with prior art atomic focusing. Furthermore, spherical and chromatic aberrational effects can be reduced.