The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Nov. 06, 2001
Applicants:
Mathias Destarac, Paris, FR;
Frédéric Leising, Avilly Saint Leonard, FR;
Alex Dureault, Paris, FR;
Daniel Taton, Camarsac, FR;
Yves Gnanou, Talence, FR;
Ramiro Guerrero-santos, Mexique, MX;
Inventors:
Mathias Destarac, Paris, FR;
Frédéric Leising, Avilly Saint Leonard, FR;
Alex Dureault, Paris, FR;
Daniel Taton, Camarsac, FR;
Yves Gnanou, Talence, FR;
Ramiro Guerrero-Santos, Mexique, MX;
Assignee:
Other;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K005/5398 ; C08L025/02 ;
U.S. Cl.
CPC ...
Abstract
The invention concerns a method for preparing a first generation polymer comprising a step which consists in free radical polymerization of a composition comprising: at least an ethylenically unsaturated monomer, a source of free radicals, and at least a cyclic organic compound including at least a tetrathiophosphate group.