The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Dec. 04, 2002
Dieter Schläfer, Ludwigshafen, DE;
Josef Guth, Freinsheim, DE;
Hans-ulrich Schlimper, Dudenhofen, DE;
Dieter Schläfer, Ludwigshafen, DE;
Josef Guth, Freinsheim, DE;
Hans-Ulrich Schlimper, Dudenhofen, DE;
BASF Aktiengesellschaft, Ludwigshafen, DE;
Abstract
The present invention relates to a process for preparing largely HBr-free HCl gas and largely HBr-free aqueous HCl solution, which comprises the following steps: The process of the present invention allows high-purity aqueous HCl solution for use in the semiconductor industry to be prepared inexpensively and on an industrial scale. However, the purified HCl gas obtained by means of steps a) to c) can also be used for any other purposes. The invention likewise provides an apparatus for carrying out the process of the present invention.