The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2005

Filed:

Feb. 28, 2000
Applicant:

Michael Inman, Abingdon, GB;

Inventor:

Michael Inman, Abingdon, GB;

Assignee:

Accentus PLC, Didcot, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J019/08 ;
U.S. Cl.
CPC ...
Abstract

A reactor for the plasma-assisted processing of a gaseous medium, including a pair of electrodes having facing surfaces the separation of which is substantially uniform, with a body of dielectric material positioned between them and defining a plurality of gas passages extending through the space between the electrodes.


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