The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Jun. 11, 1999
Applicant:
Edward K. Pavelchek, Stow, MA (US);
Inventor:
Edward K. Pavelchek, Stow, MA (US);
Assignee:
Shipley Company, L.L.C., Marlborough, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01B013/00 ;
U.S. Cl.
CPC ...
Abstract
New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition ('ARC') for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.