The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2005

Filed:

Aug. 01, 2002
Applicants:

Kiyoshi Natsume, Mikkabi-cho, JP;

Hiroshi Naito, Hamamatsu, JP;

Inventors:

Kiyoshi Natsume, Mikkabi-cho, JP;

Hiroshi Naito, Hamamatsu, JP;

Assignee:

Yamaha Corporation, Shizuoka-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/3205 ;
U.S. Cl.
CPC ...
Abstract

A sacrificial film is formed on a substrate and a mask layer is formed on the sacrificial film. An opening having a predetermined pattern is formed through the mask layer. The sacrificial film exposed in the opening is removed to form a cave broader than the opening on the substrate. A noble metal thin film is deposited on the whole substrate surface. The sacrificial filmis dissolved and removed to form a noble metal thin film pattern.


Find Patent Forward Citations

Natsume, Kiyoshi. (2005). Method of forming noble metal thin film pattern (U.S. Patent No. 6890447). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6890447

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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