The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Aug. 23, 2002
Terunao Tsuchiya, Shinjuku-ku, JP;
Takuya Sakata, Shinjuku-ku, JP;
Terunao Tsuchiya, Shinjuku-ku, JP;
Takuya Sakata, Shinjuku-ku, JP;
Abstract
A second metal mask () having a screen part (A) provided with a plurality of parallel, fine slits () arranged at very small intervals is placed on a base plate () serving also as a first metal mask and provided with a plurality of windows () defining regions in which a material is to be deposited. One end of the second metal mask () is fastened to the base plate () by a mask clamp () and the other end of the same is fastened to a slider (). Resilient force is applied to the slider () by compression coil springs (). Thus, the screen part (A) of the second metal mask () is tensioned and thereby the slits () are stretched straight and are extended at predetermined pitches. A substrate () placed on the second mask () is subjected to a vacuum evaporation process to form fine patterns on the substrate () in a gang-patterning mode.