The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2005

Filed:

Dec. 22, 2000
Applicants:

Naomi Nishiki, Kyoto-fu, JP;

Tosinobu Yokoyama, Osaka-fu, JP;

Yuji Uesugi, Osaka-fu, JP;

Kiyotaka Ihara, Osaka-fu, JP;

Ayumu Takakuwa, Hyogo-ken, JP;

Kiyohito Miwa, Nara-ken, JP;

Yoshikazu Iwai, Osaka-fu, JP;

Inventors:

Naomi Nishiki, Kyoto-fu, JP;

Tosinobu Yokoyama, Osaka-fu, JP;

Yuji Uesugi, Osaka-fu, JP;

Kiyotaka Ihara, Osaka-fu, JP;

Ayumu Takakuwa, Hyogo-ken, JP;

Kiyohito Miwa, Nara-ken, JP;

Yoshikazu Iwai, Osaka-fu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J009/14 ;
U.S. Cl.
CPC ...
Abstract

A method of manufacturing a shadow mask assembly, in which a shadow mask is fastened to a support frame in a tensioned state, includes applying a preliminary tension force with a magnitude of 9.8 to 490 N to the four corners of the shadow mask outwardly aslant with respect to sides of the shadow mask. A main tension force is then applied to each of at least a pair of mutually opposite sides of the shadow mask outwardly perpendicularly to the sides. Thereafter, the shadow mask to which the main tension forces have been applied is fastened to the frame side of the support frame.


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