The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2005

Filed:

Jul. 28, 2003
Applicant:

Hidetsugu Shimura, Nagano-ken, JP;

Inventor:

Hidetsugu Shimura, Nagano-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G015/00 ;
U.S. Cl.
CPC ...
Abstract

For optimization of a direct current developing bias Vavg, a patch image Ivn is formed whose length is longer than a circumferential length Lof a photosensitive member. From an average value of sensor outputs sampled over the length Lof the patch image, a toner density of the patch image Ivn is calculated and a value corresponding to an average value ODavg of optical densities OD is accordingly found. This cancels an influence of density variations appearing in association with rotating cycles of the photosensitive member exerted over a patch image.


Find Patent Forward Citations

Shimura, Hidetsugu. (2005). Apparatus and method of forming patch image for optimizing density control factor (U.S. Patent No. 6889015). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6889015

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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