The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Feb. 16, 2001
Peter C. Sercel, Pasadena, CA (US);
Kerry J. Vahala, San Gabriel, CA (US);
David W. Vernooy, Monrovia, CA (US);
Guido Hunziker, Monrovia, CA (US);
Peter C. Sercel, Pasadena, CA (US);
Kerry J. Vahala, San Gabriel, CA (US);
David W. Vernooy, Monrovia, CA (US);
Guido Hunziker, Monrovia, CA (US);
Xponent Photonics Inc, Monrovia, CA (US);
Abstract
A method for cylindrical processing of an optical medium, including optical fiber and optical materials of substantially cylindrical form. The method of the preferred embodiments includes the steps of rotating an optical medium about a longitudinal relative rotation axis thereof relative to a processing tool; spatially selectively applying the processing tool to a portion of a surface of the optical medium in operative cooperation with relative rotation of the optical medium and the processing tool, thereby producing a patterned (i.e., spatially selective) structural alteration of the optical medium, the pattern including altered, differentially-altered and unaltered portions of the optical medium. Specialized techniques for spatially selectively generating the structural alteration may include masking/etching, masking/deposition, machining or patterning with lasers or beams, combinations thereof, and/or functional equivalents thereof.