Method of array substrate for transflective liquid crystal display device

Abstract

A manufacturing method of an array substrate for a transflective liquid crystal display device includes forming a gate insulator on a gate line and a gate electrode formed on a substrate. A data line, source and drain electrodes are formed on an ohmic contact layer formed on an active layer on the gate insulator. A first passivation layer made of a first material is deposited on the data line, source and drain electrodes. A second passivation layer made of a second material is deposited on the first passivation layer. The second passivation layer is patterned, thereby forming a first drain contact hole exposing the first passivation layer over the drain electrode. A reflector is formed on the second passivation layer, the reflector having a first transmissive hole The first passivation layer is patterned thereby forming a second drain contact hole exposing the drain electrode. The second drain contact hole corresponds to the first drain contact hole. A transparent electrode is formed on the second passivation layer and on the reflector, wherein the transparent electrode is connected to the drain electrode through the first and second drain contact holes.