The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Oct. 21, 2003
Applicants:
Won Song, Seoul, KR;
Seong-il Kim, Suwon, KR;
Sang-il Han, Seoul, KR;
Chang-hoon Lee, Seoul, KR;
Choung-hee Kim, Suwon, KR;
Inventors:
Won Song, Seoul, KR;
Seong-Il Kim, Suwon, KR;
Sang-Il Han, Seoul, KR;
Chang-Hoon Lee, Seoul, KR;
Choung-Hee Kim, Suwon, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L023/544 ; H01L021/76 ;
U.S. Cl.
CPC ...
Abstract
An alignment mark and an exposure alignment system and method using the alignment mark for aligning wafers are described. The alignment mark is formed of a plurality of mesa or trench type unit marks that are aligned in an inline pattern within an underlying layer under a layer to which a chemical mechanical polishing process is applied to form an alignment signal during an alignment process, thereby preventing a dishing phenomenon caused by the chemical mechanical process.