The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Dec. 11, 2002
Oliver Harnack, Stuttgart, DE;
Jurina Wessels, Stuttgart, DE;
William E. Ford, Stuttgart, DE;
Akio Yasuda, Stuttgart, DE;
Oliver Harnack, Stuttgart, DE;
Jurina Wessels, Stuttgart, DE;
William E. Ford, Stuttgart, DE;
Akio Yasuda, Stuttgart, DE;
Sony International (Europe) GmbH, Berlin, DE;
Abstract
The invention relates to a method for defect and conductivity engineering of an individual part in a conducting nanoscaled structure by generating heat-induced migration, melting, sputtering and/or evaporation of conductive material of the nanoscaled structure by directing a focussed electron beam on this individual part of the structure to be engineered. The invention further relates to the use of a secondary electron microscope having a filter for detecting back scattered electrons for such a method and a respective secondary electron microscope having such a filter for detecting back scattered electrons.