The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Dec. 03, 2002
Heiko Müller, Heidelberg, DE;
Harald Rose, Darmstadt, DE;
Heiko Müller, Heidelberg, DE;
Harald Rose, Darmstadt, DE;
CEOS Corrected Electron Optical Systems GmbH, Heidelberg, DE;
Abstract
An optical particle corrector with a straight optical axis for eliminating color and aperture aberrations in optical particle lenses includes multipole elements in the form of electric and/or magnetic quadrupole and octupole elements. There are at least twelve quadrupole elements and ten octupole elements, in which three quadrupole elements and two octupole elements are assembled into a group. These groups are arranged successively along the straight optical axis, in which a first symmetrical plane is defined between the first and second groups, a second symmetrical plane is defined between the second and third groups and a third symmetrical plane is defined between the third and fourth groups. The multipole elements from one group to another correspond to each other in pairs, in which the multipole elements of the corresponding following group are positioned in reverse order along the straight optical axis in comparison with the corresponding multipole elements of the preceding group. The structure and refractive powers of the multipole elements that correspond to each other are mirror-symmetrically configured relative to the corresponding symmetrical plane between the groups. At least two of the quadrupole elements generate electric-magnetic quadrupole fields, in which the quadrupole element are, preferably, arranged in a mirror-symmetrical manner relative to the second, or to all, symmetrical planes. An additional octupole element is arranged in the first and third symmetrical planes. The corrector enables the transmission of extremely large image fields, while the optical quality remains the same due to the fact image aberrations outside the axis can be corrected.