The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Dec. 28, 2000
Peiguang Zhou, Appleton, WI (US);
Lance James Garrett, Jr., Neenah, WI (US);
Peiguang Zhou, Appleton, WI (US);
Lance James Garrett, Jr., Neenah, WI (US);
Kimberly-Clark Worldwide, Inc., Neenah, WI (US);
Abstract
A latent material having various controlled shrinkage tensions and patterns and a method of making the same. The materials include polymer materials that are capable of absorbing microwave energy. Different degrees of shrinkage of the material may be controlled to create different tensions in the material. Additionally, various stereo and three-dimensional patterns may be generated on the material. These materials may be used in the formation of personal care articles. The materials are made by incorporating a polymer material onto the film, wherein the polymer material is capable of turning microwave energy into heat. Upon exposure to microwave radiation, the heat will cause the latent material to shrink. The use of different types and amounts of polymer materials will result in a latent material having different tensions and patterns.