The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Mar. 15, 2002
J. Michael Alford, Lakewood, CO (US);
Michael D. Diener, Denver, CO (US);
J. Michael Alford, Lakewood, CO (US);
Michael D. Diener, Denver, CO (US);
TDA Research, Inc., Wheat Ridge, CO (US);
Abstract
Filter devices and methods for collection of carbon nanomaterials, including fullerenes, produced in gas phase reactors are provided. The filter devices provide for in situ cleaning of filters to release captured product for collection. Product can be released and removed from the reactor without disrupting continuous synthesis of carbon nanomaterials. The filter devices facilitate increased reactor operation and larger scale production of carbon nanomaterials. The filters are cleaned by application of a motive force and/or a gas flow to the filter. In a specific embodiment filters are cleaned by a reverse flow of gas pulses to the filter provided. The invention also provides reactor systems for gas phase synthesis of carbon nanomaterials that can be operated continuously employing the filter device of this invention. Preferred reactor systems are those which synthesize carbon nanomaterials by combustion. Methods for continuous production of carbon nanomaterials using the filtering devices and methods of this invention are also provided.