The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6886815 B1

PDF
Full Text
Expired
Date of Patent:
May. 03, 2005

Filed:

Apr. 10, 2001
Applicants:

Claude Parayre, Lunel, FR;

Nelly Kernevez, Corenc, FR;

Gérard Gibon, Sassenage, FR;

Inventors:

Claude Parayre, Lunel, FR;

Nelly Kernevez, Corenc, FR;

Gérard Gibon, Sassenage, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B040/04 ;
U.S. Cl.
CPC ...
Abstract

A porous wall through which a flow of gas is established forming a layer supporting a liquid mass is strengthened partly to stiffen it and partly to control the shape of the lower surface of the supported liquid. Chambers containing different pressures can be formed, and possibly, separated by some of these strengthening parts to improve the equalisation by reducing the pressure at the center. Finally, capillaries may pass through the plate to measure the pressure or provide additional equalisation of the thickness of the layer by a suction device.


Find Patent Forward Citations

Parayre, Claude. (2005). Porous wall for forming a levitation gas film (U.S. Patent No. 6886815). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6886815

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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