The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Dec. 27, 2001
Ki Bong Song, Daejon-Shi, KR;
Jeong Yong Kim, Daejon-Shi, KR;
Kang Ho Park, Daejon-Shi, KR;
Abstract
A method of manufacturing a head for recording and reading optical data. The method includes: providing a silicon substrate on which a silicon oxide film and a silicon deposition layer are stacked; etching the bottom of the silicon substrate by a given depth to form an opening; forming an aperture having a given slant angle in the silicon deposition layer located on the opening; etching the portion of the silicon oxide film, exposed through the opening; forming a dielectric layer on the silicon deposition layer including the aperture; removing an exposed portion of the bottom of the silicon deposition layer by a given thickness to expose a portion of the dielectric layer, forming a probe on the exposed portion of the dielectric layer and the silicon deposition layer exposed through the opening; and burying the aperture with a non-linear material.