The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Aug. 07, 2002
Takashi Okuyama, Saitama, JP;
Takashi Okuyama, Saitama, JP;
PENTAX Corporation, Tokyo, JP;
Abstract
A multi-exposure drawing apparatus for drawing a given pattern on a workpiece is provided. The apparatus uses an exposure unit with optical modulation elements arranged in a matrix. The apparatus comprises a first, second, and third memory, a coordinate transformation processor, a calculation processor, and an exposure-data generating processor. The first, second, and third memory respectively stores raster-data of the given pattern, first-coordinate data representing a position of each optical modulation element, and second-coordinate data representing a position of the exposure unit. The coordinate transformation is performed for the first-coordinate data. Address-data is calculated in accordance with a pixel size of the raster-data, and is based on the sum of the first and second coordinate data. Exposure-data generated by outputting the raster-data of the address-data is given to each of the optical modulation elements. The given pattern is drawn on the drawing surface as to the exposure-data.