The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2005

Filed:

Dec. 23, 2002
Applicant:

Rémy Klausz, Neuilly/Seine, FR;

Inventor:

Rémy Klausz, Neuilly/Seine, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K001/00 ;
U.S. Cl.
CPC ...
Abstract

A method of fabricating an antiscatter grid, an antiscatter grid element and the antiscatter grid formed by the method comprising: forming grid elements by covering portions of at least one substrate with strips made of a radiation absorbent material wherein the portions of the substrate are dimensioned with a width greater than the width of the strips made of the absorbent material. The grid elements are superimposed. Pressing or grasping the superimposed grid elements at least on the parts of the element not covered with the absorbent material. The elements can be formed on a single substrate or on strips of substrate each one supporting a strip made of the absorbent material.


Find Patent Forward Citations

Loading…