The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Sep. 10, 2003
Applicant:
Hiromichi Hara, Tochigi, JP;
Inventor:
Hiromichi Hara, Tochigi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/42 ; G03B027/52 ; G03B027/58 ;
U.S. Cl.
CPC ...
Abstract
An exposure apparatus has a structure supported by a vibration isolating mechanism and a partition wall inserted in at least part of the optical path of exposure light used in the exposure apparatus. The structure and partition wall are coupled by an elastic seal member to form a closed space, and the interior of the partition wall is partitioned from the remaining space.
Hara, Hiromichi. (2005). Exposure apparatus and method of manufacturing a semiconductor device using the same (U.S. Patent No. 6885431). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6885431
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile