The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Apr. 02, 2003
Takehiro Shiraishi, Ome, JP;
Makoto Sumi, Tokorozawa, JP;
Makoto Horiuchi, Kodaira, JP;
Konica Corporation, Tokyo, JP;
Abstract
There is described a thermal development apparatus, which makes it possible to prevent generation of density variations caused by changes of the processing temperature during the thermal developing operation when the thermal developing photosensitive material is continuously processed, without increasing the cost of the apparatus so much. The thermal development apparatus includes a thermal developing processor to apply a thermal development processing to the thermal developing photosensitive material, a detector to detect the thermal developing photosensitive material to be conveyed into the thermal developing processor and a controller to control the thermal developing processor in a feed forward controlling mode based on a processing condition of the thermal developing processor. The processing condition is established in advance, corresponding to a load of processing the thermal developing photosensitive material detected in advance by the detector.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile