The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Aug. 21, 2001
Orson Bourne, Orleans, CA;
David Rayner, Ottawa, CA;
Paul Corkum, Gloucester, CA;
Manjusha Mehendale, Somerset, NJ (US);
Andrei Yu Naumov, Kanata, CA;
Orson Bourne, Orleans, CA;
David Rayner, Ottawa, CA;
Paul Corkum, Gloucester, CA;
Manjusha Mehendale, Somerset, NJ (US);
Andrei Yu Naumov, Kanata, CA;
National Research Council of Canada, Ottawa, CA;
Abstract
The present invention relates to a method for writing an optical structure within a workpiece of a dielectric material using FLDM. In a first embodiment system parameters for the FLDM are determined in dependence upon the dielectric material, a predetermined volume element and a predetermined change of the refractive index of the dielectric material within the predetermined volume element. The system parameters are determined such that self-focusing of a pulsed femtosecond laser beam is inhibted by non-linear absorption of the energy of the pulsed femtosecond laser beam within the dielectric material. A pulsed femtosecond laser beam based on the determined system parameters is focused at a predetermined location within the workpiece for inducing a change of the refractive index through dielectric modification within the predetermined volume element, the volume element including the focus. Various embodiments enable writing of various different optical structures into a workpiece.