The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2005

Filed:

Apr. 03, 2002
Applicants:

Ken Nakashima, Kumamoto, JP;

Kazuhiro Kobayashi, Kumamoto, JP;

Inventors:

Ken Nakashima, Kumamoto, JP;

Kazuhiro Kobayashi, Kumamoto, JP;

Assignee:

Advanced Display, Inc., Nishigoshi-machi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/20 ;
U.S. Cl.
CPC ...
Abstract

In the halftone region of a photomask, uniformity in thickness of the photoresist is enhanced. The halftone region of the photomask is arranged such that a transmitting portion and a shielding portion are alternately provided to form a transmitting/shielding pattern. The transmitting portion at the end of the transmitting/shielding pattern has a larger area than the other transmitting portion.


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