The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Dec. 22, 2001
Applicants:
Hartmut Westphal, Dermbach/Rhön, DE;
Volkmar Sottke, Mülheim, DE;
Inventors:
Hartmut Westphal, Dermbach/Rhön, DE;
Volkmar Sottke, Mülheim, DE;
Assignee:
Widia GmbH, Essen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C014/58 ; C23C016/56 ;
U.S. Cl.
CPC ...
Abstract
A method of increasing the compressive stress or of reducing the tensile residual stress of a CVD layer, a PCVD layer or PVD layer and a cutting insert for machining. The invention relates to a method of increasing the compressive residual stress or of reducing the tensile residual stress of a hard material outer layer or a hard material outermost layer in which the coated substrate after coating is subjected to a dry blast treatment using a granular blast agent that, according to the invention, has a maximum diameter of 150 μm.