The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
May. 26, 2004
Moris Dovek, San Jose, CA (US);
Wenjie Chen, Cupertino, CA (US);
Moris Dovek, San Jose, CA (US);
Wenjie Chen, Cupertino, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A lapping guide system and method for lapping a merged read/write head are disclosed. The resistance Rof a first ELG near the sensor in the read head is correlated to the resistance Rof a second ELG and to the width of a first optical lapping guide (OLG) near the neck region of the write head. As the lapping progresses, Rand Rincrease and the OLG width along the lapping plane increases. Thus, an OLG width and a Rcorresponding to a target neck height or throat height and a Rcorresponding to a target stripe height are determined. A lapping plane is actively tilted to enable write head dimensions to be independently controlled on a per wafer or per row basis. The first OLG is a triangular feature with one side parallel to the lapping plane and the other two sides converging near the lapping plane.