The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Jul. 16, 2004
Yoshinori Maeno, Tokyo, JP;
Takeshi Takamori, Tokyo, JP;
Hironori Sasaki, Yamanashi, JP;
Masahiro Uekawa, Kanagawa, JP;
Yoshinori Maeno, Tokyo, JP;
Takeshi Takamori, Tokyo, JP;
Hironori Sasaki, Yamanashi, JP;
Masahiro Uekawa, Kanagawa, JP;
Oki Electric Industrt Co., Ltd., Tokyo, JP;
Abstract
A method for forming many microlenses comparatively easily and effectively is provided. On one end of an optical substrate is formed a plurality of lens planes at regular intervals. Lens areas containing the lens planes are partially covered by an etching mask and etching processing is performed on areas being exposed outside the etching mask to remove the areas to a specified depth. While the lens planes formed on one surface of the optical substrate are being held by a support substrate, polishing processing is performed on another end face of the optical substrate and each microlens formed in the lens areas is separated from the support substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile