The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
May. 09, 2003
Ann L. Peebles, Santa Monica, CA (US);
Alan R. Cherrette, Hermosa Beach, CA (US);
Stuart T. Linsky, Rancho Palos Verdes, CA (US);
Ann L. Peebles, Santa Monica, CA (US);
Alan R. Cherrette, Hermosa Beach, CA (US);
Stuart T. Linsky, Rancho Palos Verdes, CA (US);
Northrop Grumman Corporation, Los Angeles, CA (US);
Abstract
A side-fed dual reflector antenna system () of the present invention overcomes the size cost and complexity limitations associated with conventional single and multiple reflector antenna systems. The antenna system () includes a feed array () including separate feeds for generating separate respective antenna beams, a subreflector () for reflecting the separate respective antenna beams generated by the separate feeds of the feed array (), and a reflector () having a shaped reflecting surface for reflecting the separate respective antenna beams received from the subreflector () toward a terrestrial target () to produce substantially contiguous flat beams, each of which provides substantially uniform coverage within a predetermined coverage area on the terrestrial target. The subreflector () and each of the separate feeds in the feed array () are arranged so that a center of each of the separate respective antenna beams illuminates a center of the reflector () subsequent to being reflected from the subreflector ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile