The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Oct. 26, 2000
Börje Sellergren, Mainz, DE;
Gunter Büchel, Frankfurt, DE;
Börje Sellergren, Mainz, DE;
Gunter Büchel, Frankfurt, DE;
MIP Technologies AB, Lund, SE;
Abstract
A porous, molecularly imprinted polymer and a process for its preparation are described. The porous, molecularly imprinted polymer is characterised in that it is obtainable by providing a porous silica; attaching a molecular template to the surface of the porous silica; filling the pores of the porous silica with a polymer, removing the silica and the molecular template, thereby leaving a porous, molecularly imprinted polymer. The process is characterised by the above defined process steps. Also described are a porous polymer vesicle and its preparation with the same features as defined for the porous, molecularly imprinted polymer and its preparation, except for the lack of the molecular template and thus the lack of the molecular imprint in the porous polymer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile