The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Dec. 05, 2002
Shinobu Isobe, Tateyama, JP;
Shinobu Isobe, Tateyama, JP;
UMC Japan, Chiba-ken, JP;
Abstract
A production process for a semiconductor apparatus is provided in which there is no danger of particle generation, and consequently no danger of associated problems resulting from the presence of particles, such as shorting, and which as a result, is capable of producing improved product yields, good product quality stability and improved product reliability. A resistis formed on those regions of a N-type silicon substrateon which wiring is not to be formed, a conductive layeris formed across the entire surface of the N-type silicon substrateincluding the resist, and the conductive layeris then polished by mechanical polishing, as this result, the surface of the resistis exposed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile