The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2005
Filed:
Jul. 29, 2003
Michael R. Feldman, Huntersville, NC (US);
James E. Morris, Charlotte, NC (US);
Hongtao Han, Mooresville, NC (US);
Xiansong Chen, Charlotte, NC (US);
Yinbao Yang, Charlotte, NC (US);
Michael R. Feldman, Huntersville, NC (US);
James E. Morris, Charlotte, NC (US);
Hongtao Han, Mooresville, NC (US);
Xiansong Chen, Charlotte, NC (US);
Yinbao Yang, Charlotte, NC (US);
Digital Optics Corp, Charlotte, NC (US);
Abstract
Etching in combination with other processing techniques is used to facilitate alignment of an optical die in an optical system. The optical dies are formed on a wafer level and need to be singulated for use in the optical system. The formation of a precise edge from etching allows more accurate alignment of the optical die in the optical system. The other processing techniques include dicing, sawing, cleaving, breaking and thinning.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile