The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2005

Filed:

Jan. 29, 2003
Applicant:

Shrenik Deliwala, Orefield, PA (US);

Inventor:

Shrenik Deliwala, Orefield, PA (US);

Assignee:

SiOptical, Inc., Allentown, PA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B006/26 ; G02B006/42 ; G02B006/12 ; G02B006/10 ;
U.S. Cl.
CPC ...
Abstract

An effective index modifier that modifies light propagation in a waveguide. The device is formed on a wafer, such as a Silicon-On-Insulator (SOI) wafer that includes an insulator layer and an upper silicon layer. A waveguide is formed at least in part in the upper silicon layer of the SOI wafer. The waveguide guides an optical signal by total internal reflection. At least one micro-mechanical system (MEMS) having at least one movable component is disposed a positive distance away from the waveguide. Application of voltage to the MEMS results in a variation of the distance between the moveable component and the waveguide, which in turn alters the effective index of the waveguide in a location proximate the moveable object, thereby resulting in modification of light propagation in the waveguide.


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