The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Sep. 21, 2002
Applicants:
Hiroshi Nakamura, Kyoto, JP;
Masayuki Adachi, Kyoto, JP;
Inventors:
Hiroshi Nakamura, Kyoto, JP;
Masayuki Adachi, Kyoto, JP;
Assignee:
Horiba, Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N021/59 ;
U.S. Cl.
CPC ...
Abstract
A method and apparatus for infrared gas analysis are provided. The method includes measuring a concentration of a component in the sample gas, and measuring a concentration of water in the sample gas. The component concentration measurement is corrected with respect to water interference at a zero point. The component concentration measurement is further corrected with respect to water influence in coexistence to determine a corrected measurement that is corrected with respect to water interference at the zero point and water influence in coexistence.