The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2005

Filed:

Feb. 22, 2001
Applicants:

Harry W. Deckman, Clinton, NJ (US);

Ronald Richard Chance, Annandale, NJ (US);

John Di-yi Ou, Houston, TX (US);

James Alexander Mchenry, Washington, NJ (US);

Juan José Reinoso, Houston, TX (US);

Inventors:

Harry W. Deckman, Clinton, NJ (US);

Ronald Richard Chance, Annandale, NJ (US);

John Di-Yi Ou, Houston, TX (US);

James Alexander McHenry, Washington, NJ (US);

Juan José Reinoso, Houston, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C005/22 ;
U.S. Cl.
CPC ...
Abstract

A process and a system for increasing para-xylene production from a Caromatic feedstream by coupling at least one xylene isomerization reactor with at least one pressure swing adsorption unit or temperature swing absorption unit to produce a product having a super-equilibrium para-xylene concentration. This product is then subjected to para-xylene separation and purification.


Find Patent Forward Citations

Loading…