The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Apr. 05, 2003
Applicants:
Edward W. Rutter, Jr., Pleasanton, CA (US);
Cuong Manh Tran, San Jose, CA (US);
Edward C. Orr, Vancouver, WA (US);
Inventors:
Edward W. Rutter, Jr., Pleasanton, CA (US);
Cuong Manh Tran, San Jose, CA (US);
Edward C. Orr, Vancouver, WA (US);
Assignee:
Marlborough,, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/30 ;
U.S. Cl.
CPC ...
Abstract
Compositions and methods for the removal of patterned photodefinable materials, such as photoresists and/or photoimageable dielectric materials, from substrates are provided. Such compositions and methods are useful in the manufacture of electronic devices. Methods of reworking electronic device substrates by removing patterned photodefinable material from an underlying organic film are also provided.