The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2005

Filed:

Mar. 14, 2001
Applicants:

David Emil Nelson, Waterford, MI (US);

Mark David Hemingway, Columbiaville, MI (US);

Gregory Stephen Sims, Detroit, MI (US);

Inventors:

David Emil Nelson, Waterford, MI (US);

Mark David Hemingway, Columbiaville, MI (US);

Gregory Stephen Sims, Detroit, MI (US);

Assignee:

Delphi Technologies, Inc., Troy, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J019/08 ;
U.S. Cl.
CPC ...
Abstract

A simplified, low cost method for preparing a non-thermal plasma reactor comprises forming cell building blocks of material having a high dielectric constant, printing a conductive print onto the cell walls, assembling the cells into a multi-cell stack, providing electrical connections for connecting said cells to a high voltage source, applying insulation to said multi-cell stack, and inserting the multi-cell stack into a non-thermal plasma reactor housing. The simplified design eliminates the need for spacers between individual cells, thus reducing the total number of components. The method employing formed shape building blocks provides flexibility and may be used in conjunction with conventional processing methods. The printing sequence is defined from the top of the multi-cell stack to the bottom, further minimizing the number of components. Use of a three-dimensional conductive print further simplifies preparation by eliminating the need for a secondary conductive print along the edge of the stack.


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