The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Nov. 04, 2003
Applicant:
Frank Breme, Hausen am Albis, CH;
Inventor:
Frank Breme, Hausen am Albis, CH;
Assignee:
Satis Vacuum Industries Vertriebs AG, Baar, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C014/34 ;
U.S. Cl.
CPC ...
Abstract
A method and apparatus for producing an optically effective system of layers on a substrate, such as a lens for use in an optical device. A plasma supported sputter deposition process is employed which, for the purpose of reducing damage to the rear side () first applies a protective layer () to the rear side and then applies a system of layers () on the front side () of the substrate (). The apparatus includes an evacuable sputter chamber and a substrate holder () with receiving elements () for the substrates, and the receiving elements are mounted to permit rotation about two mutually perpendicular axes.