The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Apr. 09, 2003
Hirohito Yamaguchi, Kanagawa, JP;
Masahiro Kanai, Tokyo, JP;
Atsushi Koike, Kanagawa, JP;
Katsunori Oya, Kanagawa, JP;
Hirohito Yamaguchi, Kanagawa, JP;
Masahiro Kanai, Tokyo, JP;
Atsushi Koike, Kanagawa, JP;
Katsunori Oya, Kanagawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Sputtering particles emitted from a target are ionized by the Penning ionization process. And the sputtering particles ionized are caused to fly in the direction of the substrate by a magnetic field formed by ambipolar diffusion due to a magnetic field generating means without scattering the particles to deposit the particles on the substrate. The partial pressure of a sputtering discharge gas in a discharge space is set to 1.3 Pa or less and a distance from the target to an ionization space is within twice the mean free path of the partial pressure of the sputtering discharge gas.