The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Mar. 05, 2001
Hiroyuki Ozaki, Kyotanabe, JP;
Shotaro Okabe, Nara, JP;
Masahiro Kanai, Tokyo, JP;
Yuzo Koda, Kyotanabe, JP;
Tadashi Hori, Nara, JP;
Hiroyuki Ozaki, Kyotanabe, JP;
Shotaro Okabe, Nara, JP;
Masahiro Kanai, Tokyo, JP;
Yuzo Koda, Kyotanabe, JP;
Tadashi Hori, Nara, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
To provide an apparatus for forming a deposited film, which is a parallel plate electrode type CVD apparatus, with a discharge vessel receiving a material gas flowing therein and discharging air therefrom, decomposing the material gas by the aid of a plasma generated therein, and depositing the film on the substrate, in which the exhaust port of the material gas exhaust means has an opening wider in the lateral direction than the parallel plate electrode. This structure diminishes the stagnant region of the material gas during the deposited film forming process and controls formation of by-products, to deposit the film uniform in quality and thickness.