The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2005
Filed:
Mar. 27, 2002
Ivett Alejandra Leyva, Niskayuna, NY (US);
Ivett Alejandra Leyva, Niskayuna, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
A shock wave reflector includes a number of reflective units positioned along a longitudinal direction and separated by a gap G. Each reflective unit has a length L. The length L and the gap G are governed by a relationship L+G≧λ. The variable λ characterizes a cell size for a detonation mixture. A detonation chamber includes a receiving end, a discharge end, and a wall extending along a longitudinal direction between the receiving and discharge ends. The detonation chamber further includes a number of reflective units formed in the wall and positioned along the longitudinal direction. The reflective units are separated by a gap G, and each reflective unit has a length L.