The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2005

Filed:

Apr. 21, 2003
Applicants:

Masaaki Kurihara, Tokyo, JP;

Shigekazu Fujimoto, Tokyo, JP;

Tetsuro Komukai, Musashino, JP;

Tetsuro Inui, Musashino, JP;

Inventors:

Masaaki Kurihara, Tokyo, JP;

Shigekazu Fujimoto, Tokyo, JP;

Tetsuro Komukai, Musashino, JP;

Tetsuro Inui, Musashino, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B006/34 ; G02B006/00 ; G02B005/18 ;
U.S. Cl.
CPC ...
Abstract

The present invention relates to a precision phase mask for forming diffraction grating in optical fiber and optical waveguide, to provide them with nonlinear chirped grating for dispersion compensation use and having low fluctuation or crosstalk in the group delay characteristics. The diffraction grating is formed by means of interference fringe between diffracted lights of different orders, in which the cycle of the diffraction gratingincreases nonlinearly, wherein plurality of diffraction gratings G, G, G. . . having different cycles are assembled on a plane in increasing order of the cycle with the directions of the diffraction gratings directed to the same direction, and assembled in such a manner that, where the cycle of grating changes nonlinearly and discontinuously, the regions having larger rate of change of the cycle contain proportionally more discontinuous phases per unit length.


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