The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2005

Filed:

Jan. 22, 2003
Applicants:

Emmanuel Fretel, Epinay sur Orge, FR;

Alain Le Marchand, Le Mesnil Saint Denis, FR;

Christophe Pecheyran, Pau, FR;

Inventors:

Emmanuel Fretel, Epinay sur Orge, FR;

Alain Le Marchand, Le Mesnil Saint Denis, FR;

Christophe Pecheyran, Pau, FR;

Assignee:

Jovin Yvon S.A.S., Longjumeau, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N021/73 ;
U.S. Cl.
CPC ...
Abstract

This invention concerns a plasma source emission spectrometer to measure a sample comprising an excitation source () having a central axis () and producing a plasma, an extraction enclosure () receiving a beam composed of ions, atoms and electrons () derived from the plasma and comprising an optical lens () collecting luminous radiations emitted by the ion beam (). According to the invention, the lens () is not exposed directly to the plasma. The invention also concerns a sighting device () comprising a metallic structure (), substantially cylindrical having a first () and second () faces ranging respectively in a first () and second () planes. The first face () comprises an input aperture () for a beam () to be analysed and the second face () comprises an output aperture () for said beam (). The first plane () forms an angle α with the normal of the second plane ().


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