The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2005
Filed:
Jan. 25, 2002
Hiroo Muramoto, Chiba, JP;
Shinichi Kimizuka, Chiba, JP;
Hiroo Muramoto, Chiba, JP;
Shinichi Kimizuka, Chiba, JP;
Nippon Soda Co., Ltd., Tokyo, JP;
Abstract
A process for making poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups, by which the degree of deblocking of the phenolic hydroxyl groups is controlled. Namely, the production of a polymer containing, in the molecule, repeating units of the general formula (IA) and those of the general formula (IB), comprising adding an acid to polymer (B) containing in the molecule repeating units of general formula (II) in an organic solvent with the molar ratio of the acid to the ORgroup being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. In the general formulae, Ris hydrogen or methyl; Ris Calkyl; Ris an acid-decomposable or -eliminable group; Ris hydrogen or a group derived from Rby decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.