The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2005

Filed:

Nov. 24, 1998
Applicants:

Gayle Marie Frankenbach, Cincinnati, OH (US);

Ellen Schmidt Baker, Cincinnati, OH (US);

Rebecca Gayl Baker, Hamilton, OH (US);

Marc Johan Declercq, Bever, BE;

Hugo Jean Marie Demeyere, Merchtem, BE;

Ryan Matthew Heiden, Amelia, OH (US);

Charles Albert Hensley, Cincinnati, OH (US);

Brent Alan Kolb, Cincinnati, OH (US);

Ruth Anne Murphy, Cincinnati, OH (US);

Ronald Edward Pegoli, Batavia, OH (US);

Toan Trinh, Maineville, OH (US);

Errol Hoffman Wahl, Cincinnati, OH (US);

Michael R. Weaver, Cincinnati, OH (US);

Dean Larry Duval, Kobe, JP;

John Henry Shaw, Jr., Cincinnati, OH (US);

Masae Nogami, Suita, JP;

Ronghui Wu, Gurnee, IL (US);

Inventors:

Gayle Marie Frankenbach, Cincinnati, OH (US);

Ellen Schmidt Baker, Cincinnati, OH (US);

Rebecca Gayl Baker, Hamilton, OH (US);

Marc Johan Declercq, Bever, BE;

Hugo Jean Marie Demeyere, Merchtem, BE;

Ryan Matthew Heiden, Amelia, OH (US);

Charles Albert Hensley, Cincinnati, OH (US);

Brent Alan Kolb, Cincinnati, OH (US);

Ruth Anne Murphy, Cincinnati, OH (US);

Ronald Edward Pegoli, Batavia, OH (US);

Toan Trinh, Maineville, OH (US);

Errol Hoffman Wahl, Cincinnati, OH (US);

Michael R. Weaver, Cincinnati, OH (US);

Dean Larry DuVal, Kobe, JP;

John Henry Shaw, Jr., Cincinnati, OH (US);

Masae Nogami, Suita, JP;

Ronghui Wu, Gurnee, IL (US);

Assignee:

The Procter & Gamble Company, Cincinnati, OH (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C11D003/04 ;
U.S. Cl.
CPC ...
Abstract

Clear, or translucent fabric softener compositions comprise fabric softener compound, principal solvent system, and high electrolyte levels. The high electrolyte level allows for a broader range of principal solvents to be used and/or reduces the incidence of increased viscosity when low levels of principal solvent are used. Phase stabilizers which are primarily ethoxylated hydrophobic materials can be used to reduce the amount of principal solvent that is needed and/or to stabilize the compositions in the presence of the highest levels of electrolyte. Specific phase stabilizers provide additional benefits including improved softening. Specific electrolytes provide improved results. Addition of primary solvents and/or phase stabilizers to the softener compounds can improve the viscosity/handling of the compounds and the ability to create the finished compositions.


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