The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2005
Filed:
Mar. 08, 2002
Noriaki Hara, Kanagawa-ken, JP;
Somei Yarita, Kanagawa-ken, JP;
Ken Hagiwara, Kanagawa-ken, JP;
Ritsuya Matsuzaka, Kanagawa-ken, JP;
Noriaki Hara, Kanagawa-ken, JP;
Somei Yarita, Kanagawa-ken, JP;
Ken Hagiwara, Kanagawa-ken, JP;
Ritsuya Matsuzaka, Kanagawa-ken, JP;
Tanaka Kikinzoku Kogyo K.K., , JP;
Abstract
The present invention is directed to a precious metal sputtering target having a columnar crystallographic microstructure such that crystals are grown in a direction normal to the sputtering surface in order to solve conventional problems. The high-purity sputtering target of the present invention prevents chipping of a minute cluster mass that occurs in a sputtering target produced through casting or powder metallurgy; produces thin film of excellent quality; and has considerably reduced internal defects.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile