The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2005

Filed:

Apr. 17, 2002
Applicants:

Masahiro Yamagata, Takasago, JP;

Hisanori Oshiba, Takasago, JP;

Yoshihiko Sakashita, Takasago, JP;

Yoichi Inoue, Takasago, JP;

Yusuke Muraoka, Kyoto, JP;

Kimitsugu Saito, Kyoto, JP;

Ikuo Mizobata, Kyoto, JP;

Ryuji Kitakado, Kyoto, JP;

Inventors:

Masahiro Yamagata, Takasago, JP;

Hisanori Oshiba, Takasago, JP;

Yoshihiko Sakashita, Takasago, JP;

Yoichi Inoue, Takasago, JP;

Yusuke Muraoka, Kyoto, JP;

Kimitsugu Saito, Kyoto, JP;

Ikuo Mizobata, Kyoto, JP;

Ryuji Kitakado, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B003/02 ;
U.S. Cl.
CPC ...
Abstract

A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed. Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.


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