The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2005

Filed:

Jan. 10, 2002
Applicant:

Xin LI, Vancouver, WA (US);

Inventor:

Xin Li, Vancouver, WA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K009/40 ;
U.S. Cl.
CPC ...
Abstract

Methods and apparatus for digital data array edge enhancement are disclosed. A local data window containing a data sample s is selected. Minimum and maximum sample values, max and min, are located within the window, and an edge deflection value ed is defined to have a value between max and min. A diffusion quantity is then calculated to move the value of s towards max, if s is greater than ed, or towards min, if s is smaller than ed. This approach has advantages over gradient-based edge-enhancement, including simplicity, convergence speed, and stability.


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Li, Xin. (2005). Nonlinear edge-enhancement filter (U.S. Patent No. 6873741). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6873741

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