The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Nov. 16, 2001
Vincent Detalle, Montréal, CA;
Marc Dufour, Outremont, CA;
Jean-pierre Monchalin, Montréal, CA;
Mohamad Sabsabi, Boucherville, CA;
Louis St-onge, Côte-Saint-Luc, CA;
Vincent Detalle, Montréal, CA;
Marc Dufour, Outremont, CA;
Jean-Pierre Monchalin, Montréal, CA;
Mohamad Sabsabi, Boucherville, CA;
Louis St-Onge, Côte-Saint-Luc, CA;
National Research Council of Canada, Ottawa, CA;
Abstract
Laser ablation combined with spectrometric analysis is a good tool for determining the composition of heterogeneous materials. By measuring the depth of an ablation crater at a target of a heterogeneous material, it is possible to generate a compositional profile as a function of the depth. It is also possible to generate a 3 dimensional profile by depth profiling of a plurality of craters. The depth measurement is conducted in situ and in real time so that the evolution of composition as a function of the depth can be measured. An interferometric technique with a short coherence length light is one of the preferred embodiments for measuring the depth in situ and in real time.