The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Jul. 28, 2003
Applicant:
Jung-chih Kuo, Taichung, TW;
Inventor:
Jung-Chih Kuo, Taichung, TW;
Assignee:
Nanya Technology Corporation, Taoyuan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/68 ; G03B027/52 ;
U.S. Cl.
CPC ...
Abstract
An exposure system. The exposure system includes a compensation unit and an exposure device. The compensation unit receives at least one adjustment value of a corresponding equipment parameter, and compensates a corresponding overlay parameter according to the adjustment value and an adjustment formula corresponding to the equipment parameter. The exposure device performs overlay and exposure processes on a wafer using the compensated overlay parameter.