The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2005

Filed:

Feb. 04, 2003
Applicants:

Pushpa Mahalingam, Richardson, TX (US);

Robert Hung Nguyen, Richardson, TX (US);

Philipp Steinmann, Richardson, TX (US);

Eric W. Beach, Tucson, AZ (US);

Siang Ping Kwok, Dallas, TX (US);

Inventors:

Pushpa Mahalingam, Richardson, TX (US);

Robert Hung Nguyen, Richardson, TX (US);

Philipp Steinmann, Richardson, TX (US);

Eric W. Beach, Tucson, AZ (US);

Siang Ping Kwok, Dallas, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/4763 ;
U.S. Cl.
CPC ...
Abstract

A thin film resistor structure () is formed on a dielectric layer (). A capping layer () is formed above said thin film resistor structure () and vias () are formed in the capping layer () using a two step etching process comprising of a dry etch process and a wet etch process. Conductive layers () are formed in the vias and form electrical contacts to the thin film resistor structure ().


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